Invention Grant
- Patent Title: Method of manufacturing linear grid for substrate, and mold and display apparatus manufactured by the same
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Application No.: US14995326Application Date: 2016-01-14
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Publication No.: US10175526B2Publication Date: 2019-01-08
- Inventor: Dong-hwan Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Nixon & Vanderhye P.C.
- Priority: KR10-2015-0020852 20150211
- Main IPC: H01L21/469
- IPC: H01L21/469 ; G02F1/1335 ; G03F7/00 ; G02B5/30

Abstract:
A method of manufacturing a linear grid on a substrate to form a linear grid pattern of a display panel, the method including: laminating a negative photoresist layer having a linear grid pattern on a first area of a substrate, said substrate including a pattern forming layer disposed thereon; laminating a positive photoresist layer having a linear grid pattern on a second area of the substrate and overlapping at least a portion of the negative photoresist layer of the first area; covering the second area with a mask and exposing the first area; and forming a linear grid pattern by removing the mask and etching the pattern forming layer.
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Information query
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