- 专利标题: 183 nm CW laser and inspection system
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申请号: US15806953申请日: 2017-11-08
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公开(公告)号: US10175555B2公开(公告)日: 2019-01-08
- 发明人: Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA—Tencor Corporation
- 当前专利权人: KLA—Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Bever, Hoffman & Harms, LLP
- 主分类号: G02F1/35
- IPC分类号: G02F1/35 ; G02F1/355
摘要:
A laser assembly generates continuous wave (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.
公开/授权文献
- US20180188633A1 183 nm CW Laser And Inspection System 公开/授权日:2018-07-05
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