- 专利标题： Lithographic apparatus, a dryer and a method of removing liquid from a surface
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申请号： US15495548申请日： 2017-04-24
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公开(公告)号： US10185231B2公开(公告)日： 2019-01-22
- 发明人: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Elaine Markoya
- 申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- 申请人地址： NL Veldhoven NL Veldhoven
- 专利权人： ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- 当前专利权人： ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
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