Invention Grant
- Patent Title: Metal oxide thin film transistor and manufacturing method thereof, display substrate and display device
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Application No.: US15122902Application Date: 2015-07-17
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Publication No.: US10199395B2Publication Date: 2019-02-05
- Inventor: Meili Wang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: Boe Technology Group Co., Ltd.
- Current Assignee: Boe Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Womble Bond Dickinson (US) LLP
- Priority: CN201510180005 20150416
- International Application: PCT/CN2015/084343 WO 20150717
- International Announcement: WO2016/165224 WO 20161020
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/66 ; H01L29/786 ; H01L21/4763 ; H01L29/45

Abstract:
The present disclosure provides a metal oxide thin film transistor, wherein an oxygen deficiency adsorptive removal layer comprising an oxygen deficiency adsorptive removal material is provided between an active layer and a source, and/or between the active layer and a drain. The standard Gibbs free energy of formation of an oxide of the oxygen deficiency adsorptive removal material in a unit volume is larger than that of a metal oxide in the active layer. The present disclosure further provides a display substrate comprising the metal oxide thin film transistor and a display device comprising the display substrate.
Public/Granted literature
- US20170092660A1 METAL OXIDE THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF, DISPLAY SUBSTRATE AND DISPLAY DEVICE Public/Granted day:2017-03-30
Information query
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