Invention Grant
- Patent Title: RRAM cell structure with laterally offset BEVA/TEVA
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Application No.: US15223399Application Date: 2016-07-29
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Publication No.: US10199575B2Publication Date: 2019-02-05
- Inventor: Chih-Yang Chang , Wen-Ting Chu , Kuo-Chi Tu , Yu-Wen Liao , Hsia-Wei Chen , Chin-Chieh Yang , Sheng-Hung Shih , Wen-Chun You
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
The present disclosure relates to a resistive random access memory (RRAM) device. The RRAM device has a bottom electrode arranged over a bottom electrode via. A variable resistive dielectric layer is arranged over the bottom electrode. The variable resistive dielectric layer extends to within a recess in an upper surface of the bottom electrode. A top electrode is disposed over the variable resistive dielectric layer. A top electrode via extends outward from an upper surface of the top electrode at a position centered along a first axis that is laterally offset from a second axis centered upon the recess within the upper surface of the bottom electrode. The top electrode via has a smaller total width than the top electrode.
Public/Granted literature
- US20170141301A1 RRAM CELL STRUCTURE WITH LATERALLY OFFSET BEVA/TEVA Public/Granted day:2017-05-18
Information query
IPC分类: