Invention Grant
- Patent Title: ESD protection device
-
Application No.: US14846168Application Date: 2015-09-04
-
Publication No.: US10211058B2Publication Date: 2019-02-19
- Inventor: Jean-Phillippe Laine , Patrice Besse , Changsoo Hong , Rouying Zhan
- Applicant: FREESCALE SEMICONDUCTOR, INC.
- Applicant Address: US TX Austin
- Assignee: NXP USA, Inc.
- Current Assignee: NXP USA, Inc.
- Current Assignee Address: US TX Austin
- Priority: WOPCT/IB2015/000627 20150407
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L21/00 ; H01L21/266 ; H01L27/082 ; H01L29/06 ; H01L29/10 ; H01L27/02

Abstract:
An electrostatic discharge protection device includes a buried layer having a plurality of heavily doped regions of a first conductivity type and a laterally diffused region between adjacent heavily doped regions, a semiconductor region over the buried layer, and a first well of the first conductivity type extending from a surface of the semiconductor region to a heavily doped region. The device includes a first transistor in the semiconductor region having an emitter coupled to the first terminal, and a second transistor in the semiconductor region having an emitter coupled to the second terminal. The first well forms a collector of the first transistor and a collector of the second transistor.
Public/Granted literature
- US20160300828A1 ESD PROTECTION DEVICE Public/Granted day:2016-10-13
Information query
IPC分类: