Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
-
Application No.: US15838572Application Date: 2017-12-12
-
Publication No.: US10222711B2Publication Date: 2019-03-05
- Inventor: Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
- Applicant: ASML NETHERLANDS B. V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus with a cover plate formed separately from a substrate table, the cover plate configured to be to a side of the substrate during exposure, the cover plate being removable from the substrate table and supported on the substrate table by a protrusion. The lithographic apparatus further includes a linear encoder system configured to measure at least translation of the substrate table, a part of the linear encoder system being on the substrate table and located outward of the cover plate.
Public/Granted literature
- US20180113388A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2018-04-26
Information query
IPC分类: