Invention Grant
- Patent Title: Swirled flow chemical vapor deposition
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Application No.: US15677378Application Date: 2017-08-15
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Publication No.: US10227696B2Publication Date: 2019-03-12
- Inventor: Chong M. Cha , David Liliedahl , Richard Kidd , Ross Galligher , Nicholas Doan
- Applicant: Rolls-Royce Corporation , Rolls-Royce High Temperature Composites, Inc.
- Applicant Address: US IN Indianapolis US CA Cypress
- Assignee: Rolls-Royce Corporation,Rolls-Royce High Temperature Composites, Inc.
- Current Assignee: Rolls-Royce Corporation,Rolls-Royce High Temperature Composites, Inc.
- Current Assignee Address: US IN Indianapolis US CA Cypress
- Agency: Shumaker & Sieffert, P.A.
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/04 ; C23C16/44 ; C23C16/458 ; C23C16/46 ; C23C16/52 ; C23C16/24 ; F01D5/28

Abstract:
A method includes heating, using a heat source, a reactor vessel including a substrate in a radially central core region of the reactor vessel and introducing, using at least one reactor inlet in an outer wall of the reactor vessel, a precursor gas to the reactor vessel. The at least one reactor inlet is configured to swirling flow of the precursor gas around the radially central core region of the reactor vessel. The material deposits on the substrate from the precursor gas. The method includes removing, using at least one reactor outlet, an exhaust gas from the reactor vessel.
Public/Granted literature
- US20180057931A1 SWIRLED FLOW CHEMICAL VAPOR DEPOSITION Public/Granted day:2018-03-01
Information query
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