Invention Grant
- Patent Title: Methods, apparatus and system for forming wrap-around contact with dual silicide
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Application No.: US15900264Application Date: 2018-02-20
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Publication No.: US10236218B1Publication Date: 2019-03-19
- Inventor: Ruilong Xie , Julien Frougier , Hiroaki Niimi , Nigel Cave , Xusheng Kevin Wu
- Applicant: GLOBALFOUNDRIES, INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: William Morgan, P.C.
- Main IPC: H01L21/8238
- IPC: H01L21/8238 ; H01L27/092 ; H01L29/66 ; H01L21/02 ; H01L21/3213

Abstract:
At least one method, apparatus and system disclosed herein involves forming semiconductor devices comprising dual silicides in contacts to FinFETs. The semiconductor device may comprise a PFET fin; an NFET fin; a first metal silicide around the NFET fin; a second metal silicide around the PFET fin; and a fill metal around the second metal silicide, above the PFET fin, and above the NFET fin. Methods of forming such devices are also disclosed.
Information query
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