Invention Grant
- Patent Title: Pre-spacer self-aligned cut formation
-
Application No.: US15899685Application Date: 2018-02-20
-
Publication No.: US10236256B2Publication Date: 2019-03-19
- Inventor: Xunyuan Zhang , Shao Beng Law
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Thompson Hine LLP
- Agent Anthony Canale
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L21/768

Abstract:
Methods of forming self-aligned cuts and structures formed with self-aligned cuts. A dielectric layer is formed on a metal hardmask layer, and a mandrel is formed on the dielectric layer. A cut is formed that extends through the dielectric layer to the metal hardmask layer. A section of a metal layer is formed on an area of the metal hardmask layer exposed by the cut in the dielectric layer. After the metal layer is formed, a spacer is formed on a vertical sidewall of the mandrel.
Public/Granted literature
- US20180301413A1 PRE-SPACER SELF-ALIGNED CUT FORMATION Public/Granted day:2018-10-18
Information query
IPC分类: