Invention Grant
- Patent Title: Method for manufacturing transparent electrode
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Application No.: US15093379Application Date: 2016-04-07
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Publication No.: US10236398B2Publication Date: 2019-03-19
- Inventor: Woo-Seok Cheong
- Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Applicant Address: KR Daejeon
- Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee Address: KR Daejeon
- Priority: KR10-2015-0096099 20150706; KR10-2015-0174338 20151208
- Main IPC: H01L31/0224
- IPC: H01L31/0224 ; H01L51/56 ; G06F3/041

Abstract:
The present disclosure relates to a transparent electrode, and provides a method for manufacturing a transparent electrode, the method comprising forming a multi-layered transparent conductive film by sequentially laminating a first oxide layer, a metal layer, and a second oxide layer on a transparent substrate, forming a mask pattern on the second oxide layer, performing an etching process using the mask pattern as an etching mask to form, in the second oxide layer, a trench exposing the upper surface of the metal layer, and forming a metal pattern in the trench.
Public/Granted literature
- US20170012147A1 METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE Public/Granted day:2017-01-12
Information query
IPC分类: