Invention Grant
- Patent Title: Method and system for large silicon photonic interposers by stitching
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Application No.: US15950876Application Date: 2018-04-11
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Publication No.: US10236996B2Publication Date: 2019-03-19
- Inventor: Peter De Dobbelaere , Attila Mekis , Gianlorenzo Masini
- Applicant: Luxtera, Inc.
- Applicant Address: US CA Carlsbad
- Assignee: Luxtera, Inc.
- Current Assignee: Luxtera, Inc.
- Current Assignee Address: US CA Carlsbad
- Agency: McAndrews, Held & Malloy
- Main IPC: G02B6/34
- IPC: G02B6/34 ; H04B10/80 ; G02B6/42 ; G02B6/122

Abstract:
Methods and systems for large silicon photonic interposers by stitching are disclosed and may include, in an integrated optical communication system including CMOS electronics die coupled to a silicon photonic interposer, where the interposer includes a plurality of reticle sections: communicating an optical signal between two of the plurality of reticle sections utilizing a waveguide. The waveguide may include a taper region at a boundary between the two reticle sections, the taper region expanding an optical mode of the communicated optical signal prior to the boundary and narrowing the optical mode after the boundary. A continuous wave (CW) optical signal may be received in a first of the reticle sections from an optical source external to the interposer. The CW optical signal may be received in the interposer from an optical source assembly coupled to a grating coupler in the first of the reticle sections in the silicon photonic interposer.
Public/Granted literature
- US20180234189A1 Method And System For Large Silicon Photonic Interposers By Stitching Public/Granted day:2018-08-16
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