A management system for a plant facility is disclosed. The system includes a first field device that measures a process value, a first control node that calculates a first control value based on the process value, a second field device that operates according to the first control value, and an application node that configures one or more parameters for calculating the first control value. The first control node compares the first control value with a second control value calculated by one of the first field device, a second control node, and the application node. When determining that the first and the second control value are identical, the first control node sets the first control value to the second field device.