Invention Grant
- Patent Title: Method and apparatus for inspection and metrology
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Application No.: US15580500Application Date: 2016-07-05
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Publication No.: US10248029B2Publication Date: 2019-04-02
- Inventor: Sietse Thijmen Van Der Post , Ferry Zijp , Sander Bas Roobol
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2016/065786 WO 20160705
- International Announcement: WO2017/012857 WO 20170126
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20

Abstract:
A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.
Public/Granted literature
- US20180188658A1 METHOD AND APPARATUS FOR INSPECTION AND METROLOGY Public/Granted day:2018-07-05
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