- 专利标题: Method and apparatus for inspection and metrology
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申请号: US15580500申请日: 2016-07-05
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公开(公告)号: US10248029B2公开(公告)日: 2019-04-02
- 发明人: Sietse Thijmen Van Der Post , Ferry Zijp , Sander Bas Roobol
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2016/065786 WO 20160705
- 国际公布: WO2017/012857 WO 20170126
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03F7/20
摘要:
A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.
公开/授权文献
- US20180188658A1 METHOD AND APPARATUS FOR INSPECTION AND METROLOGY 公开/授权日:2018-07-05
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