Invention Grant
- Patent Title: Capped magnetic memory
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Application No.: US15735395Application Date: 2015-06-19
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Publication No.: US10256395B2Publication Date: 2019-04-09
- Inventor: Daniel R. Lamborn , Oleg Golonzka , Christopher J. Wiegand , Philip E. Heil , M D Tofizur Rahman , Rebecca J. Castellano , Tarun Bansal
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Trop, Pruner & Hu, P.C.
- International Application: PCT/US2015/036555 WO 20150619
- International Announcement: WO2016/204774 WO 20161222
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L43/02 ; H01L43/08 ; H01L43/12 ; G11C11/16 ; H01L27/22 ; H01L43/10

Abstract:
An embodiment includes an apparatus comprising: a magnetic tunnel junction (MTJ), between first and second electrodes, comprising a dielectric layer between fixed and free layers; a dielectric film directly contacting sidewalls of the first electrode; and a metallic layer coupled to the sidewalls via the dielectric film; wherein (a) a vertical axis intersects the first and second electrodes and the MTJ but not the metallic layer, (b) a first horizontal axis intersects the metallic layer, the dielectric film, and the first electrode; and (c) a second horizontal axis, between the first horizontal axis and the MTJ, intersects the dielectric film and the first electrode but not the capping layer. Other embodiments are described herein.
Public/Granted literature
- US20180182952A1 CAPPED MAGNETIC MEMORY Public/Granted day:2018-06-28
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