Invention Grant
- Patent Title: Fabrication method of magnetic device
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Application No.: US14981914Application Date: 2015-12-29
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Publication No.: US10259172B2Publication Date: 2019-04-16
- Inventor: Wei-Chin Huang , Chuan-Sheng Chuang , Chih-Hsien Wu , Ching-Chih Lin , Wen-Hsi Lee , Kai-Jyun Jhong
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Priority: TW104142574A 20151217
- Main IPC: B29C67/00
- IPC: B29C67/00 ; B33Y10/00 ; B33Y80/00 ; B29C64/153 ; B29C64/364 ; B33Y70/00 ; B29L31/00

Abstract:
A fabrication method of magnetic device is provided. A magnetic material is provided. A portion of the magnetic material is selectively irradiated by an energy beam, and reactive gas is introduced simultaneously. The magnetic material being irradiated is melted and solidified to form a solidified layer. An outer layer of the solidified layer reacts with the reactive gas to form a barrier layer, so as to form a magnetic unit including the solidified layer and the barrier layer. It is determined whether the manufacturing process of the same layer is finished, if not, the energy beam is moved to the other portion of the magnetic material. The above step is repeated to overlap multiple magnetic units to form a magnetic layer. If yes, the flow returns to the 1st step to provide another magnetic material to the magnetic layer. The above steps are repeated to form a 3D magnetic device.
Public/Granted literature
- US20170173873A1 FABRICATION METHOD OF MAGNETIC DEVICE Public/Granted day:2017-06-22
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