Invention Grant
- Patent Title: Magnetoresistive random access memory devices and methods of manufacturing the same
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Application No.: US15213706Application Date: 2016-07-19
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Publication No.: US10263035B2Publication Date: 2019-04-16
- Inventor: Sung-Min Ahn , Ji-Su Ryu , Seung-Min Lee
- Applicant: Sung-Min Ahn , Ji-Su Ryu , Seung-Min Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2015-0164501 20151124
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L27/22 ; H01L43/02 ; H01L43/10

Abstract:
An MRAM device includes a lower electrode on a substrate, an MTJ structure on the lower electrode, a metal oxide pattern on the MTJ structure, a conductive pattern on at least a portion of a sidewall of the metal oxide pattern, and an upper electrode on the metal oxide pattern and the conductive pattern. The conductive pattern has a thickness varying along the sidewall of the metal oxide pattern in a plan view.
Public/Granted literature
- US20170148848A1 MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2017-05-25
Information query
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