Invention Grant
- Patent Title: Storage bag for polycrystalline silicon ingot, method for packing polycrystalline silicon ingot, and method for producing CZ silicon single crystal
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Application No.: US15534102Application Date: 2015-12-04
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Publication No.: US10266964B2Publication Date: 2019-04-23
- Inventor: Shuichi Miyao , Junichi Okada
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-255604 20141217
- International Application: PCT/JP2015/006026 WO 20151204
- International Announcement: WO2016/098304 WO 20160623
- Main IPC: C30B29/06
- IPC: C30B29/06 ; B65D81/24 ; C01B33/02 ; C30B15/00

Abstract:
In the present invention, as a bag to store polycrystalline silicon ingots, there is used a bag in which the concentration of paraffinic hydrocarbons in a concentrate of solvent-soluble components obtained by Soxhlet extraction using acetone as a solvent is lower than 300 ppmw as a value measured by GC-MS method; the concentration of antioxidants, lower than 10 ppmw; the concentration of ultraviolet absorbents, lower than 5 ppmw; and the concentration of antistatic agents and surfactants, lower than 50 ppmw. Then, when the polycrystalline silicon ingots are packed, preferably, the polycrystalline silicon ingots are put in the storage bag; thereafter, the storage bag is sealed; further, the storage bag is put and sealed in a linear low-density polyethylene bag containing an antistatic agent or a surfactant added in the bag material.
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