Invention Grant
- Patent Title: Image sensing device and manufacturing method thereof
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Application No.: US15487593Application Date: 2017-04-14
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Publication No.: US10269840B2Publication Date: 2019-04-23
- Inventor: Feng-Chi Hung , Jen-Cheng Liu , Ching-Chun Wang , Tse-Hua Lu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H04N3/14
- IPC: H04N3/14 ; H04N5/335 ; H04N9/04 ; H04N5/225 ; H01L31/062 ; H01L31/113 ; H01L27/146

Abstract:
The image sensing device includes a pixel region in a pixel array area and a dummy pixel region in a periphery area. The pixel region includes a radiation region, a floating diffusion region, a transfer transistor, a source-follower transistor, a reset transistor and a select transistor. The dummy pixel region includes a radiation region and a floating diffusion region. A gate of one of the transfer transistor, the reset transistor and the select transistor in the pixel region is electrically connected to the radiation region or the floating diffusion region in the dummy pixel region.
Public/Granted literature
- US20180301486A1 IMAGE SENSING DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-10-18
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