- Patent Title: Micro-electro-mechanical system and manufacturing method thereof
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Application No.: US14826249Application Date: 2015-08-14
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Publication No.: US10273148B2Publication Date: 2019-04-30
- Inventor: Chun-Wen Cheng , Jung-Huei Peng , Chia-Hua Chu , Nien-Tsung Tsai , Yao-Te Huang , Li-Min Hung , Yu-Chia Liu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L29/84
- IPC: H01L29/84 ; H01L21/02 ; B81B7/00

Abstract:
Some embodiments of the present disclosure provide a microelectromechanical systems (MEMS). The MEMS includes a semiconductive block. The semiconductive block includes a protruding structure. The protruding structure includes a bottom surface. The semiconductive block includes a sensing structure. A semiconductive substrate includes a conductive region. The conductive region includes a first surface under the sensing structure. The first surface is substantially coplanar with the bottom surface. A dielectric region includes a second surface not disposed over the first surface.
Public/Granted literature
- US20170044004A1 MICRO-ELECTRO-MECHANICAL SYSTEM AND MANUFACTURING METHOD THEREOF Public/Granted day:2017-02-16
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