- 专利标题: Non-volatile memory cell and non-volatile memory
-
申请号: US15168252申请日: 2016-05-31
-
公开(公告)号: US10276726B2公开(公告)日: 2019-04-30
- 发明人: Jiun Shiung Wu , Ya-Chin King , Chrong-Jung Lin
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: JCIPRNET
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/788 ; H01L27/10 ; H01L27/105 ; H01L27/11519 ; H01L27/11524 ; H01L27/11526 ; H01L27/115
摘要:
An non-volatile memory cell is described. The non-volatile memory cell includes a substrate, insulators, a floating gate and a control gate. The substrate has a fin. The insulators are located over the substrate, wherein the fin is located between the insulators. The floating gate is located over the fin and the insulators. The control gate is located over the floating gate on the insulators and includes at least one of first contact slots located over the sidewalls of the floating gate.
公开/授权文献
- US20170345941A1 NON-VOLATILE MEMORY CELL AND NON-VOLATILE MEMORY 公开/授权日:2017-11-30
信息查询
IPC分类: