- 专利标题: Semiconductor memory device and method of manufacturing the same
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申请号: US15703006申请日: 2017-09-13
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公开(公告)号: US10283517B2公开(公告)日: 2019-05-07
- 发明人: Takuo Ohashi , Fumiki Aiso
- 申请人: Toshiba Memory Corporation
- 申请人地址: JP Minato-ku
- 专利权人: TOSHIBA MEMORY CORPORATION
- 当前专利权人: TOSHIBA MEMORY CORPORATION
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: H01L27/11578
- IPC分类号: H01L27/11578 ; H01L27/11582 ; H01L27/11563 ; H01L27/1157 ; H01L27/11514 ; H01L27/11551 ; H01L27/11524 ; H01L27/11556
摘要:
According to an embodiment, a semiconductor memory device includes a plurality of control gate electrodes, a semiconductor layer, and a charge accumulation layer. The plurality of control gate electrodes are provided as a stack above a substrate. The semiconductor layer has as its longitudinal direction a direction perpendicular to the substrate, and faces the plurality of control gate electrodes. The charge accumulation layer is positioned between the control gate electrode and the semiconductor layer. A lower end of the charge accumulation layer is positioned more upwardly than a lower end of a lowermost layer-positioned one of the control gate electrodes.
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