Invention Grant
- Patent Title: Overlapping pattern projector
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Application No.: US16005720Application Date: 2018-06-12
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Publication No.: US10288417B2Publication Date: 2019-05-14
- Inventor: Zafrir Mor , Boris Morgenstein
- Applicant: APPLE INC.
- Applicant Address: US CA Cupertino
- Assignee: APPLE INC.
- Current Assignee: APPLE INC.
- Current Assignee Address: US CA Cupertino
- Agency: Kligler & Associates
- Main IPC: G02B27/10
- IPC: G02B27/10 ; G01B11/25 ; G02B5/18 ; H01S5/00 ; H01S5/42 ; G02B27/20 ; G02B27/42 ; G06K9/20 ; G06F3/03 ; G06F3/042 ; G06K9/00 ; H01S5/022 ; F21Y115/10

Abstract:
An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
Public/Granted literature
- US20180292200A1 Overlapping pattern projector Public/Granted day:2018-10-11
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