- 专利标题: Ion implantation modification of archwires
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申请号: US15391060申请日: 2016-12-27
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公开(公告)号: US10292790B2公开(公告)日: 2019-05-21
- 发明人: Nader M. Kalkhoran
- 申请人: N2 Biomedical LLC
- 申请人地址: US MA Bedford
- 专利权人: N2 Biomedical LLC
- 当前专利权人: N2 Biomedical LLC
- 当前专利权人地址: US MA Bedford
- 代理机构: Hunter Clark PLLC
- 主分类号: A61C7/00
- IPC分类号: A61C7/00 ; A61C7/20 ; C23C14/48 ; C23C14/06
摘要:
Techniques and methods for utilizing ion implantation to modify dental archwires are provided. An example of a method of ion implanting a wire target includes providing the wire target in an ion implant system, implanting ions into the wire target such that a color of the wire target material after the implanting exhibits a changed appearance from the color of the wire target material before the implanting, and removing the wire target from the ion implant system. An example of a copper-aluminum-nickel (CuAlNi) wire includes an ion implanted atomic species wherein a color of an implanted CuAlNi wire is white, off-white and/or silver and further wherein the implanted CuAlNi wire exhibits mechanical properties of an unimplanted CuAlNi wire.
公开/授权文献
- US20170181813A1 ION IMPLANTATION MODIFICATION OF ARCHWIRES 公开/授权日:2017-06-29
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