- Patent Title: Bidirectional power MOSFET structure with a cathode short structure
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Application No.: US15720097Application Date: 2017-09-29
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Publication No.: US10297684B2Publication Date: 2019-05-21
- Inventor: Tanuj Saxena , Vishnu K. Khemka , Raghu Gupta , Moaniss Zitouni , Ganming Qin
- Applicant: NXP USA, Inc.
- Applicant Address: US TX Austin
- Assignee: NXP USA, Inc.
- Current Assignee: NXP USA, Inc.
- Current Assignee Address: US TX Austin
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/78

Abstract:
A field effect device includes a semiconductor body separating a source and a drain, both source and drain coupled to the semiconductor body. An insulated control gate is located over the semiconductor body between the source and drain and configured to control a conductive channel extending between the source and drain. First and second doped regions such as highly-doped regions are adjacent to the source. The first or second doped region may be a cathode short region electrically coupled to the source. The cathode short region may be used in a bidirectional power MOSFET.
Public/Granted literature
- US20190103484A1 BIDIRECTIONAL POWER MOSFET STRUCTURE WITH A CATHODE SHORT STRUCTURE Public/Granted day:2019-04-04
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