Invention Grant
- Patent Title: Scatterometry method and system
-
Application No.: US14852897Application Date: 2015-09-14
-
Publication No.: US10302414B2Publication Date: 2019-05-28
- Inventor: Gilad Wainreb , Etai Littwin , Alok Vaid , Michael Klots , Cornel Bozdog , Matthew Sendelbach
- Applicant: Nova Measuring Instruments Ltd. , GLOBAL FOUNDRIES
- Applicant Address: IL Rehovot KY Grand Cayman
- Assignee: NOVA MEASURING INSTRUMENTS LTD.,GLOBALFOUNDRIES INC.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.,GLOBALFOUNDRIES INC.
- Current Assignee Address: IL Rehovot KY Grand Cayman
- Agency: AlphaPatent Associates Ltd.
- Agent Daniel J. Swirsky
- Main IPC: G01B11/06
- IPC: G01B11/06 ; G03F7/20

Abstract:
A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.
Public/Granted literature
- US20160076876A1 SCATTEROMETRY METHOD AND SYSTEM Public/Granted day:2016-03-17
Information query