发明授权
- 专利标题： Method of manufacturing structure and method of manufacturing liquid ejection head
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申请号： US15660632申请日： 2017-07-26
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公开(公告)号： US10303062B2公开(公告)日： 2019-05-28
- 发明人: Yasuaki Tominaga , Tetsushi Ishikawa , Manabu Otsuka
- 申请人： CANON KABUSHIKI KAISHA
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Canon U.S.A. Inc., IP Division
- 优先权： JP2016-150410 20160729
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/09 ; B41J2/16 ; B41J2/14
摘要：
A method of manufacturing a structure including a substrate and a photosensitive resin layer provided on the substrate includes irradiating a region of the photosensitive resin layer with light in a state where a layer is provided on a surface of the substrate, the region being located above a space surrounded by the substrate and the photosensitive resin layer, and the surface facing the space, and removing a portion of the photosensitive resin layer located above the space to form a hole, wherein the provided layer has a reflectance of 40% or less with respect to the light.
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