- Patent Title: Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound
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Application No.: US15080714Application Date: 2016-03-25
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Publication No.: US10324374B2Publication Date: 2019-06-18
- Inventor: Shuhei Yamaguchi , Tomotaka Tsuchimura , Natsumi Yokokawa , Koutarou Takahashi
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Minato-Ku, Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Minato-Ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2013-205970 20130930
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C07C233/36 ; C07C271/16 ; C07C271/24 ; C07C271/34 ; C07C275/10 ; C07C275/24 ; C07C275/26 ; C07C323/60 ; C07D211/26 ; C07D233/32 ; C07D233/36 ; C07D235/26 ; C07D239/10 ; C07D251/30 ; C07D403/12 ; C07D487/04
Abstract:
There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).
Public/Granted literature
Information query
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