Invention Grant
- Patent Title: Lithographic apparatus and method
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Application No.: US15737400Application Date: 2016-06-07
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Publication No.: US10324379B2Publication Date: 2019-06-18
- Inventor: Cedric Marc Affentauschegg , Milenko Jovanovic , Richard Johannes Franciscus Van Haren , Reiner Maria Jungblut , Robertus Wilhelmus Van Der Heijden
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15173360 20150623
- International Application: PCT/EP2016/062842 WO 20160607
- International Announcement: WO2016/206965 WO 20161229
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20

Abstract:
A method to form on a substrate a first target comprising a first feature and a second target comprising a second feature, wherein the forming of the targets comprises applying the first feature and the second feature to the substrate by projection of a radiation beam through a production patterning device installed in a lithographic apparatus, the features corresponding to one or more features of the patterning device, and controlling a configuration of the lithographic apparatus to induce an aberration component, such that the first feature is applied to the substrate using a first value of an induced aberration component and the second feature is applied to the substrate using a second, different value of the induced aberration component; measuring a property of the targets; and using the measurements to determine a sensitivity of the property of the targets to changes in value of the induced aberration component.
Public/Granted literature
- US20180173099A1 Lithographic Apparatus and Method Public/Granted day:2018-06-21
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