Invention Grant
- Patent Title: Polarization independent metrology system
-
Application No.: US15766427Application Date: 2016-10-06
-
Publication No.: US10338481B2Publication Date: 2019-07-02
- Inventor: Krishanu Shome , Justin Lloyd Kreuzer
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2016/073820 WO 20161006
- International Announcement: WO2017/071925 WO 20170504
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20

Abstract:
A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
Public/Granted literature
- US20180299790A1 POLARIZATION INDEPENDENT METROLOGY SYSTEM Public/Granted day:2018-10-18
Information query