Invention Grant
- Patent Title: Method for manufacturing planar coil
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Application No.: US15840243Application Date: 2017-12-13
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Publication No.: US10354796B2Publication Date: 2019-07-16
- Inventor: Yuhei Horikawa , Makoto Orikasa , Yoshihiro Kanbayashi , Hisayuki Abe , Hirohumi Asou , Kosuke Kunitsuka
- Applicant: TDK Corporation
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Young Law Firm, P.C.
- Main IPC: H01F41/04
- IPC: H01F41/04 ; H01F41/10 ; C25D13/22 ; C23C18/16 ; C25D13/12 ; G06K19/077 ; H01Q1/38 ; H01Q1/36 ; H01Q9/27 ; H05K3/24 ; H05K3/18 ; C25D5/48 ; H01Q1/48 ; H01Q7/00

Abstract:
Disclosed herein is a method for manufacturing a planar coil, the method including forming a base conductive layer on a base material, the base conductive layer including: a coil wiring portion having one end, other end, and first to third connecting positions, the second connecting position being closer to the other end compared with the first connecting position, the third connecting position being closer to the one end compared with the second connecting position; a power-feed wiring portion that connects the first connecting position with an external power source; and a connection wiring portion that short-circuits the second connecting position and the third connecting position; forming a wiring conductive layer on the base conductive layer by electrolytic plating by feeding power from the external power source; and removing the power-feed wiring portion and the connection wiring portion.
Public/Granted literature
- US20180174748A1 METHOD FOR MANUFACTURING PLANAR COIL Public/Granted day:2018-06-21
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