Invention Grant
- Patent Title: Graphite-silicon composite and production method thereof
-
Application No.: US15206264Application Date: 2016-07-09
-
Publication No.: US10357942B2Publication Date: 2019-07-23
- Inventor: Kazuhiro Nishikawa , Naomi Nishiki , Hidetoshi Kitaura , Atsushi Tanaka , Kimiaki Nakaya , Henrik Rønnow
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2015-141731 20150716
- Main IPC: B32B9/04
- IPC: B32B9/04 ; B32B9/00 ; B32B37/06 ; B32B37/10

Abstract:
A graphite-silicon composite, including: graphite; silicon; and an intermediate layer that is located between the graphite and the silicon, wherein the intermediate layer includes oxygen, carbon and silicon. Furthermore, provided is a method for producing a graphite-silicon composite, including: layering graphite and silicon; and heating the layered graphite and silicon while applying pressure to them, wherein, during heating the layered graphite and silicon while applying pressure to them, an oxygen concentration in the atmosphere is adjusted to 0.2 vol %, the applied pressure is adjusted to 24.5 MPa or higher, and the heating temperature is adjusted to 1260° C. or higher.
Public/Granted literature
- US20170015084A1 GRAPHITE-SILICON COMPOSITE AND PRODUCTION METHOD THEREOF Public/Granted day:2017-01-19
Information query