Invention Grant
- Patent Title: Valve device and fluid pressure control device
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Application No.: US15566259Application Date: 2016-03-14
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Publication No.: US10359057B2Publication Date: 2019-07-23
- Inventor: Akio Matsuura
- Applicant: KYB Corporation
- Applicant Address: JP Tokyo
- Assignee: KYB Corporation
- Current Assignee: KYB Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rabin & Berdo, P.C.
- Priority: JP2015-083463 20150415
- International Application: PCT/JP2016/057998 WO 20160314
- International Announcement: WO2016/167065 WO 20161020
- Main IPC: E02F9/22
- IPC: E02F9/22 ; F15B11/02 ; F15B13/04 ; F16K11/07 ; F15B11/028 ; F15B13/042 ; F16K31/363

Abstract:
A valve device includes a valve body, a drain chamber wall configured to define a drain chamber, a drain port formed in the drain chamber wall facing the valving element, and a drain passage configured to guide drain fluid from another valve device to the drain chamber, wherein at least one of the drain chamber wall and the valving element includes a communicating passage configured to allow the drain port to communicate with the drain chamber when the movement of the valving element is restricted by the drain chamber wall.
Public/Granted literature
- US20180106277A1 VALVE DEVICE AND FLUID PRESSURE CONTROL DEVICE Public/Granted day:2018-04-19
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