Invention Grant
- Patent Title: Indirect determination of a processing parameter
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Application No.: US15764875Application Date: 2016-09-21
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Publication No.: US10359705B2Publication Date: 2019-07-23
- Inventor: Te-Sheng Wang
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2016/072364 WO 20160921
- International Announcement: WO2017/063827 WO 20170420
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/66 ; H01L21/027
Abstract:
A method including measuring a value of a directly measureable processing parameter of a patterning process from a portion of a substrate produced by the patterning process; obtaining a relationship between the directly measureable processing parameter and a not directly measureable processing parameter; and determining a value of the not directly measureable processing parameter from the value of the directly measureable processing parameter and the relationship.
Public/Granted literature
- US20180321596A1 INDIRECT DETERMINATION OF A PROCESSING PARAMETER Public/Granted day:2018-11-08
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