- 专利标题: Double-channel HEMT device and manufacturing method thereof
-
申请号: US15393945申请日: 2016-12-29
-
公开(公告)号: US10381470B2公开(公告)日: 2019-08-13
- 发明人: Ferdinando Iucolano , Alessandro Chini
- 申请人: STMICROELECTRONICS S.R.L.
- 申请人地址: IT Agrate Brianza
- 专利权人: STMICROELECTRONICS S.R.L.
- 当前专利权人: STMICROELECTRONICS S.R.L.
- 当前专利权人地址: IT Agrate Brianza
- 代理机构: Seed IP Law Group LLP
- 优先权: EP16425047 20160530
- 主分类号: H01L29/778
- IPC分类号: H01L29/778 ; H01L21/02 ; H01L29/20 ; H01L29/205 ; H01L29/40 ; H01L29/66 ; H01L29/06 ; H01L29/417 ; H01L29/423
摘要:
An HEMT device, comprising: a semiconductor body including a heterojunction structure; a dielectric layer on the semiconductor body; a gate electrode; a drain electrode, facing a first side of the gate electrode; and a source electrode, facing a second side opposite to the first side of the gate electrode; an auxiliary channel layer, which extends over the heterojunction structure between the gate electrode and the drain electrode, in electrical contact with the drain electrode and at a distance from the gate electrode, and forming an additional conductive path for charge carriers that flow between the source electrode and the drain electrode.
公开/授权文献
信息查询
IPC分类: