A deposition apparatus includes a chamber, a stage, a mask, a chuck, a deposition source, a laser generator, and an optical assembly. The stage is supported in the chamber. The mask is disposed on the stage. The mask includes a deposition pattern. The chuck is configured to support a substrate in the chamber. The chuck is configured to position the substrate to overlap the deposition pattern. The deposition source is disposed in the chamber. The deposition source is configured to provide a deposition material toward the substrate. The laser generator is configured to generate a laser beam. The optical assembly is configured to guide the laser beam between the mask and the substrate.