Invention Grant
- Patent Title: Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
-
Application No.: US15538851Application Date: 2015-12-22
-
Publication No.: US10385236B2Publication Date: 2019-08-20
- Inventor: Robert Reichardt , Max Siebert , Yongqing Lan , Michael Lauter , Sheik Ansar Usman Ibrahim , Reza Golzarian , Haci Osman Guevenc , Julian Proelss , Leonardus Leunissen
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/EP2015/080913 WO 20151222
- International Announcement: WO2016/102531 WO 20160630
- Main IPC: H01L21/461
- IPC: H01L21/461 ; C09G1/02 ; H01L21/306 ; H01L21/321 ; H01L21/302 ; H01L21/304 ; H01L21/463 ; B24B37/20 ; C09K3/14 ; C23F3/06 ; H01L21/768
Abstract:
A chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) containing (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) contains: (A) Inorganic particles, (B) a substituted aromatic compound with at least one carboxylic acid function as corrosion inhibitor, (C) at least one amino acid, (D) at least one oxidizer, (E) an aqueous medium, wherein the CMP composition (Q) has a pH of from 7 to 10.
Public/Granted literature
Information query
IPC分类:
