A flange for process field devices includes a first end, a second end, and a first mounting area for mounting a first field device between the first end and the second end. The first mounting area has a first device port positioned in the first mounting area to allow fluid communication with the first field device. A second mounting area on the flange is for mounting a second field device between the first end and the second end. The second mounting area has a second device port positioned in the second mounting area to allow fluid communication with the second field device. A connection port that provides fluid to the flange is located on the first end of the flange. An internal chamber fluidly connects the connection port to the first device port and the second device port.