Invention Grant
- Patent Title: Image log slope (ILS) optimization
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Application No.: US15547324Application Date: 2016-02-09
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Publication No.: US10394131B2Publication Date: 2019-08-27
- Inventor: Duan-Fu Stephen Hsu
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2016/052714 WO 20160209
- International Announcement: WO2016/128392 WO 20160818
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function of a stochastic variation of a characteristic of an aerial image or a resist image, or a function of a variable that is a function of the stochastic variation or that affects the stochastic variation, the stochastic variation being a function of a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied.
Public/Granted literature
- US20180011407A1 IMAGE LOG SLOPE (ILS) OPTIMIZATION Public/Granted day:2018-01-11
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