Invention Grant
- Patent Title: Topography measurement system
-
Application No.: US15764617Application Date: 2016-09-06
-
Publication No.: US10394143B2Publication Date: 2019-08-27
- Inventor: Nitesh Pandey , Arie Jeffrey Den Boef , Heine Melle Mulder , Willem Richard Pongers , Paulus Antonius Andreas Teunissen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15190027 20151015
- International Application: PCT/EP2016/070922 WO 20160906
- International Announcement: WO2017/063789 WO 20170420
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20

Abstract:
A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation reflected from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.
Public/Granted literature
- US20180267415A1 Topography Measurement System Public/Granted day:2018-09-20
Information query