Invention Grant
- Patent Title: Key structure
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Application No.: US15923281Application Date: 2018-03-16
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Publication No.: US10395861B2Publication Date: 2019-08-27
- Inventor: Yu-Kuang Chen
- Applicant: ASUSTeK COMPUTER INC.
- Applicant Address: TW Taipei
- Assignee: ASUSTEK COMPUTER INC.
- Current Assignee: ASUSTEK COMPUTER INC.
- Current Assignee Address: TW Taipei
- Agency: McClure, Qualey & Rodack, LLP
- Priority: TW106110022A 20170324
- Main IPC: H01H13/704
- IPC: H01H13/704

Abstract:
A key structure having a pressing area is provided. The key structure includes a first membrane and a second membrane. A first conductive layer and a first insulation layer are sequentially disposed on a surface of the first membrane. The first insulation layer has a first opening in the pressing area, so that a part of the first conductive layer is exposed from the first opening. The second membrane is disposed opposite to the first membrane. A second conductive layer and a second insulation layer are sequentially disposed on a surface of the second membrane facing the first membrane. The second insulation layer has a second opening, which is formed corresponding to the first opening, in the pressing area, so that a part of the second conductive layer is exposed from the second opening to face the first conductive layer in the first opening.
Public/Granted literature
- US20180277321A1 KEY STRUCTURE Public/Granted day:2018-09-27
Information query
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