Invention Grant
- Patent Title: Optical test system and method, and method of manufacturing semiconductor device by using the optical test system and method
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Application No.: US15940011Application Date: 2018-03-29
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Publication No.: US10401301B2Publication Date: 2019-09-03
- Inventor: Seongkeun Cho , Akinori Okubo , Tae Hyun Kim , Sangwoo Bae , Janghwi Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2017-0132283 20171012
- Main IPC: G01N21/21
- IPC: G01N21/21 ; G01N21/88 ; G01N21/95 ; H01L21/67 ; H01L21/66

Abstract:
An optical test system includes a stage region to accommodate an object to be tested, a first incident optical system which changes a first polarization state of a first light beam to a second polarization state and provide the first light beam in the second polarization state to the stage region in a first direction at a first incident angle which is not a right angle, a second incident optical system which changes a third polarization state of a second light beam to a fourth polarization state and inputs the second light beam in the fourth polarization state to the stage region in a second direction at a second incident angle which is not a right angle, and a main optical system to detect a first reflected light beam reflected from the stage region at a first reflection angle different from the first and second incident.
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