Invention Grant
- Patent Title: Control system, positioning system, lithographic apparatus and device manufacturing method
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Application No.: US15735956Application Date: 2016-05-19
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Publication No.: US10401743B2Publication Date: 2019-09-03
- Inventor: Jeroen Johannes Theodorus Hendrikus De Best , Wilhelmus Henricus Theodorus Maria Aangenent , Stan Henricus Van Der Meulen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP15172894 20150619
- International Application: PCT/EP2016/061236 WO 20160519
- International Announcement: WO2016/202519 WO 20161222
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G05B11/14

Abstract:
A control system configured to control a parameter of a dynamic system, wherein the parameter depends on an output signal. The control system comprises a set-point generator and a feedforward, wherein the set-point generator is arranged to provide a set-point signal to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.
Public/Granted literature
- US10365567B2 Control system, positioning system, lithographic apparatus and device manufacturing method Public/Granted day:2019-07-30
Information query
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