- 专利标题： Semiconductor manufacturing apparatus with supporting columns and tables
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申请号： US15915792申请日： 2018-03-08
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公开(公告)号： US10403531B2公开(公告)日： 2019-09-03
- 发明人: Fumiki Aiso , Ryota Fujitsuka , Kensei Takahashi , Takayuki Matsui , Tomohisa Iino
- 申请人： TOSHIBA MEMORY CORPORATION
- 申请人地址： JP Minato-ku
- 专利权人： TOSHIBA MEMORY CORPORATION
- 当前专利权人： TOSHIBA MEMORY CORPORATION
- 当前专利权人地址： JP Minato-ku
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2017-167818 20170831
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; H01L21/673 ; H01L21/687 ; H01L21/677 ; B25J11/00 ; B25J15/00 ; C23C16/44
摘要：
In one embodiment, a semiconductor manufacturing apparatus includes a container to contain wafers, and supporting tables provided in the container so as to be stacked on one another, and each including a supporting face that comes into contact with a wafer to support the wafer. The apparatus further includes supporting columns to join the supporting tables together and provided at positions where the supporting columns are contained inside outer circumferences of the supporting tables. The apparatus further includes a gas feeder to feed a gas to the wafers on the supporting tables, and a gas discharger to discharge the gas fed to the wafers on the supporting tables. Each of the supporting tables includes a first upper face as the supporting face, and a second upper face provided so as to surround the first upper face at a level higher than a level of the first upper face.
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