Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16005886Application Date: 2018-06-12
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Publication No.: US10424513B2Publication Date: 2019-09-24
- Inventor: Jung Il Park , Jeong Hoon Ahn , Joon-Nyung Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0156422 20171122
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/768 ; H01L23/528 ; H01L23/00 ; H01L23/58

Abstract:
A semiconductor device, comprising: a substrate which includes an active circuit region, and a boundary region surrounding the active circuit region, the boundary region including an edge portion of the substrate; a first lower conductive pattern disposed on the substrate of the boundary region; and a first upper conductive pattern connected to the first lower conductive pattern over the first lower conductive pattern, wherein the first upper conductive pattern includes a first portion having a first thickness, a second portion having a second thickness greater than the first thickness, and a third portion having a third thickness greater than the second thickness, and the third portion of the first upper conductive pattern is connected to the first lower conductive pattern, is provided.
Public/Granted literature
- US20190157150A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-05-23
Information query
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