Invention Grant
- Patent Title: Array substrate, manufacturing method thereof, and display apparatus
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Application No.: US15529495Application Date: 2016-11-07
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Publication No.: US10424604B2Publication Date: 2019-09-24
- Inventor: Rui Wang , Haijun Qiu , Fei Shang , Jaikwang Kim , Shaoru Li , Zhuo Xu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Chongqing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Chongqing
- Agency: Syncoda LLC
- Agent Feng Ma
- Priority: CN201610197197 20160331
- International Application: PCT/CN2016/104910 WO 20161107
- International Announcement: WO2017/166817 WO 20171005
- Main IPC: H01L27/28
- IPC: H01L27/28 ; H01L27/12 ; G02F1/1335 ; G02F1/1343 ; G02F1/1362

Abstract:
The present disclosure provides an array substrate, its manufacturing method, and a display apparatus containing the array substrate. The array substrate includes: a substrate; a plurality of gate lines and a plurality of data lines, disposed over the substrate and arranged in rows and columns respectively; and a plurality of pixel regions, each arranged in an area defined by crossing gate lines and data lines and comprising a pixel electrode. The plurality of data lines are configured such that in each pixel region, orthographic projection of any one of the plurality of data lines on the substrate and orthographic projection of a corresponding pixel electrode on the substrate has an overlapping area having a width of ≥0 μm.
Public/Granted literature
- US20190019815A1 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS Public/Granted day:2019-01-17
Information query
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