- 专利标题: 183 nm CW laser and inspection system
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申请号: US16205032申请日: 2018-11-29
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公开(公告)号: US10429719B2公开(公告)日: 2019-10-01
- 发明人: Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Bever, Hoffman & Harms, LLP
- 主分类号: G02F1/35
- IPC分类号: G02F1/35 ; G02F1/355
摘要:
An inspection system/method in which first optics direct continuous wave (CW) light at 181-185 nm to an inspected article, and second optics redirect image information affected by the article to detectors. A laser assembly generates the CW light by generating fourth harmonic light from first fundamental CW light having a first wavelength between 1 and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and mixing the fifth harmonic light with second light having a second wavelength between 1.26 and 1.82 μm. An external cavity mixes the first light and the fourth harmonic light using a first nonlinear crystal. The CW light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.
公开/授权文献
- US20190107766A1 183 nm CW Laser and Inspection System 公开/授权日:2019-04-11
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