Invention Grant
- Patent Title: Apparatus and techniques for beam mapping in ion beam system
-
Application No.: US15803344Application Date: 2017-11-03
-
Publication No.: US10431421B2Publication Date: 2019-10-01
- Inventor: Eric D. Wilson , George M. Gammel , Sruthi Chennadi , Daniel Tieger , Shane Conley
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC
- Current Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC
- Current Assignee Address: US MA Gloucester
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/244

Abstract:
An apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion beam. The display routine may include a measurement processor to receive a plurality of spot beam profiles of the ion beam, the spot beam profiles collected during a fast scan of the ion beam and a slow mechanical scan of a detector, conducted simultaneously with the fast scan. The fast scan may comprise a plurality of scan cycles having a frequency of 10 Hz or greater along a fast scan direction, and the slow mechanical scan being performed in a direction parallel to the fast scan direction. The measurement processor may also send a display signal to display at least one set of information, derived from the plurality of spot beam profiles.
Public/Granted literature
- US20190139740A1 APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM Public/Granted day:2019-05-09
Information query