- 专利标题: Method and apparatus for adjusting exposure gap
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申请号: US15992865申请日: 2018-05-30
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公开(公告)号: US10437161B2公开(公告)日: 2019-10-08
- 发明人: Hui Wang , Zhiqiang Wang , Guanglong Guo , Xing Tang , Wuyi Liao
- 申请人: BOE TECHNOLOGY GROUP CO., LTD. , Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- 申请人地址: CN Beijing CN Anhui
- 专利权人: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Beijing CN Anhui
- 代理机构: Calfee, Halter & Griswold LLP
- 优先权: CN201710596794 20170720
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F9/00
摘要:
A method and apparatus for adjusting an exposure gap in the manufacture of display panels. The method includes: setting a detection range of a detector based on a thickness of a substrate, wherein a position of a waveform corresponding to the thickness of the substrate is outside the detection range; in case a position of a waveform corresponding to a target exposure gap is outside the detection range, setting an intermediary exposure gap within the detection range; adjusting the exposure gap during detecting the exposure gap by the detector until the exposure gap is equal to the intermediary exposure gap, wherein the exposure gap is a distance between the substrate and a mask plate; and adjusting the exposure gap to the target exposure gap based on a difference between the target exposure gap and the intermediary exposure gap.
公开/授权文献
- US20190025715A1 METHOD AND APPARATUS FOR ADJUSTING EXPOSURE GAP 公开/授权日:2019-01-24
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