Invention Grant
- Patent Title: Chalcogenide memory device components and composition
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Application No.: US16184465Application Date: 2018-11-08
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Publication No.: US10439000B2Publication Date: 2019-10-08
- Inventor: Paolo Fantini , F. Daniel Gealy , Enrico Varesi , Swapnil A. Lengade
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Holland & Hart LLP
- Main IPC: H01L27/24
- IPC: H01L27/24 ; C01B19/00 ; C01B35/14 ; H01L27/11507 ; H01L27/11514 ; H01L45/00 ; G11C11/22 ; G11C13/00

Abstract:
Systems, devices, and methods related to or that employ chalcogenide memory components and compositions are described. A memory device, such as a selector device, may be made of a chalcogenide material composition. A chalcogenide material may have a composition that includes one or more elements from the boron group, such as boron, aluminum, gallium, indium, or thallium. A selector device, for instance, may have a composition of selenium, arsenic, and at least one of boron, aluminum, gallium, indium, or thallium. The selector device may also be composed of germanium or silicon, or both. The relative amount of boron, aluminum, gallium, indium, or thallium may affect a threshold voltage of a memory component, and the relative amount may be selected accordingly. A memory component may, for instance have a composition that includes selenium, arsenic, and some combination of germanium, silicon, and at least one of boron, aluminum, gallium, indium, or thallium.
Public/Granted literature
- US20190081103A1 CHALCOGENIDE MEMORY DEVICE COMPONENTS AND COMPOSITION Public/Granted day:2019-03-14
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